Chemical Vapor Deposition for Microelectronics: Principles, Technology and Applications

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Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics and kinetics, as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.

Format:Hardcover

Language:English

ISBN:0815511361

ISBN13:9780815511366

Release Date:January 1987

Publisher:William Andrew

Length:226 Pages

Weight:0.57 lbs.

Dimensions:0.6" x 6.0" x 9.0"

Related Subjects

Engineering Technology

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Chemical Vapor Deposition for Microelectronics: Principles, Technology and Applications

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