Film Deposition by Plasma Techniques

(Book #10 in the Springer Series on Atomic, Optical, and Plasma Physics Series)

by Mitsuharu Konuma

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Plasma deposition techniques are of major importance because they can be used to produce high-quality thin films for applications in device technology. This introduction to the subject contains sufficient details of the foundations of plasma science to be useful to newcomers to the field and, at the same time, ample information about specific techniques and new results, so that established researchers will also find it of interest.

Format:Paperback

Language:English

ISBN:3642845134

ISBN13:9783642845130

Release Date:December 2011

Publisher:Springer

Length:224 Pages

Weight:0.75 lbs.

Dimensions:0.5" x 6.1" x 9.2"

Related Subjects

Electrical & Electronics Engineering Science Science & Math Science & Scientists Science & Technology Technology

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Film Deposition by Plasma Techniques

(Book #10 in the Springer Series on Atomic, Optical, and Plasma Physics Series)

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