Handbook of Chemical Vapor Deposition, Second Edition: Principles, Technologies and Applications (Materials Science and Process Technology Series)
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Handbook of Chemical Vapor Deposition: Principles, Technology and Applications provides information pertinent to the fundamental aspects of chemical vapor deposition. This book discusses the applications of chemical vapor deposition, which is a relatively flexible technology that can accommodate many variations. Organized into 12 chapters, this book begins with an overview of the theoretical examination of the chemical vapor deposition process. This text then describes the major chemical reactions and reviews the chemical vapor deposition systems and equipment used in research and production. Other chapters consider the materials deposited by chemical vapor deposition. This book discusses as well the potential applications of chemical vapor deposition in semiconductors and electronics. The final chapter deals with ion implantation as a major process in the fabrication of semiconductors. This book is a valuable resource for scientists, engineers, and students. Production and marketing managers and suppliers of equipment, materials, and services will also find this book useful.
Format:Hardcover
Language:English
ISBN:0815513003
ISBN13:9780815513001
Release Date:January 1999
Publisher:William Andrew
Length:458 Pages
Weight:1.65 lbs.
Dimensions:1.0" x 6.0" x 9.0"
Related Subjects
Chemical Chemical Engineering Education & Reference Electrical & Electronics Electronics Engineering Engineering & Transportation Industrial Technology Industrial, Manufacturing & Operational Systems Materials & Material Science Metallurgy Microelectronics Microprocessors & System Design Reference TechnologyCustomer Reviews
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